Research and Development: Atomicity can provide advanced custom ALD tools for your research and development needs. While throughput is not a major consideration for R&D, flexibility, reliability, and film quality are very important. Atomicity’s platform can be designed for 2, 3, and even 4 precursor reaction chemistries with independent temperature and pressure/flow control. Higher order chemistries may be accommodated in the future. Typically, the tools will be configured for 100 mm wafers but there are plans to make a 200 mm tool that is backward compatible to 100mm substrates or less. Non-circular planar substrates may also be an available option.