Services

Currently we have the capability to deposit ALD films on 100 mm or smaller substrates and are nearing completion of a 300 mm and smaller substrate compatible tool. We currently offer the following films: aluminum oxide, hafnium oxide, and tantalum oxide. We are currently using water as the oxidizer. We are working on a remote plasma to produce hydrogen radicals for reducing chemistries to be able to deposit aluminum metal, etc. We have routinely performed aluminum and hafnium oxide depositions at temperatures as low as 110 degrees Celsius.

If you have a specific request for a particular film deposition and you have the necessary information regarding the specific precursors and required temperature ranges we may be able to accommodate your needs. Please feel free to contact us.